stacked gate dielectric.

Xuan Feng Hei Wong B. L. Yang Shurong Dong Hiroshi Iwai Kuniyuki Kakushima

Published in: Microelectron. Reliab. (2014)

Keyphrases

silicon dioxide
gate dielectrics
leakage current
electrical properties
artificial intelligence
transmission line
field effect transistors
nano scale
feature selection
multiscale
search algorithm
preprocessing
high density
chemical vapor deposition