Login / Signup

Dielectric charging in silicon nitride films for MEMS capacitive switches: Effect of film thickness and deposition conditions.

Usama ZaghloulGeorge J. PapaioannouFabio CoccettiPatrick PonsRobert Plana
Published in: Microelectron. Reliab. (2009)
Keyphrases
  • electrical properties
  • film thickness
  • thin film
  • chemical vapor deposition
  • silicon nitride
  • leakage current
  • white light interferometry
  • high density
  • multi layer
  • viewpoint
  • electric vehicles
  • gate dielectrics