C
search
search
reviewers
reviewers
feeds
feeds
assignments
assignments
settings
logout
Oxygen-plasma-based digital etching for GaN/AlGaN high electron mobility transistors.
Jingyi Wu
Hongyu Yu
Yang Jiang
Zeyu Wan
Siqi Lei
Wei-Chih Cheng
Guangnan Zhou
Robert Sokolovskij
Qing Wang
Guangrui Maggie Xia
Published in:
ASICON (2019)
Keyphrases
</>
integrated circuit
thin film
high density
plasma etching
electric field
circuit design
electron microscopy
wide range
high energy
electron beam
magnetic recording
space charge
digital media
database
mobile networks
power consumption
digital curves
low density
high temperature
image processing