Positive Bias Instability in ZnO TFTs with Al2O3 Gate Dielectric.
Pavel BolshakovRodolfo A. Rodriguez-DavilaManuel Quevedo-LopezChadwin D. YoungPublished in: IRPS (2019)
Keyphrases
- thin film
- chemical vapor deposition
- high density
- silicon dioxide
- field effect transistors
- multi layer
- positive and negative
- liquid crystal displays
- nano scale
- artificial intelligence
- case study
- database
- positive effects
- gate dielectrics
- plasma etching
- leakage current
- positively correlated
- variance reduction
- low cost
- machine learning
- real world