Gate Stability and Robustness of In-Situ Oxide GaN Interlayer Based Vertical Trench MOSFETs (OG-FETs).
Maria RuzzarinMatteo BorgaEnrico ZanoniMatteo MeneghiniGaudenzio MeneghessoDong JiWenwen LiSilvia H. ChanAnchal AgarwalChirag GuptaStacia KellerUmesh K. MishraSrabanti ChowdhuryPublished in: IRPS (2019)