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Structural and Electrical Properties of High Temperature Polycrystalline Silicon Films on Molybdenum Substrate.
Hyun-il Kang
Won-Suk Choi
Yeon-ho Jung
Hyun-suk Hwang
Do-young Kim
Published in:
FGIT-CA/CES3 (2011)
Keyphrases
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electrical properties
gate dielectrics
high temperature
film thickness
silicon dioxide
silicon nitride
thin film
high density
chemical vapor deposition
si sio
structural information
plasma etching
structural analysis
diesel engine
room temperature