films deposited by APCVD.
Crisóforo MoralesHéctor JuárezTomás DíazY. MatsumotoEnrique RosendoGodofredo GarciaM. RubinF. MoraMauricio PacioA. GarcíaPublished in: Microelectron. J. (2008)
Keyphrases
- permalloy films
- electrical properties
- chemical vapor deposition
- film thickness
- rf sputtering
- silicon nitride
- thin film
- magnetic field
- transmission line
- high density
- silicon dioxide
- databases
- leakage current
- grain size
- neural network
- refractive index
- room temperature
- electron microscopy
- preprocessing
- three dimensional
- real time