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Koji Eriguchi
Publication Activity (10 Years)
Years Active: 2001-2021
Publications (10 Years): 5
Top Topics
Surface Orientation
High Energy
Evaluation Methodologies
Damage Detection
Top Venues
ICICDT
IRPS
Microelectron. Reliab.
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Publications
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Tomohiro Kuyama
,
Keiichiro Urabe
,
Koji Eriguchi
Evaluation methodology for assessment of dielectric degradation and breakdown dynamics using time-dependent impedance spectroscopy (TDIS).
IRPS
(2021)
Yukimasa Okada
,
Koji Eriguchi
,
Kouichi Ono
Surface orientation dependence of ion bombardment damage during plasma processing.
ICICDT
(2015)
Koji Eriguchi
,
Kouichi Ono
Impacts of plasma process-induced damage on MOSFET parameter variability and reliability.
Microelectron. Reliab.
55 (9-10) (2015)
Zhiqiang Wei
,
Koji Katayama
,
Shunsaku Muraoka
,
Ryutaro Yasuhara
,
Takumi Mikawa
,
Koji Eriguchi
A new prediction method for ReRAM data retention statistics based on 3D filament structures.
IRPS
(2015)
Taro Ikeda
,
Akira Tanihara
,
Nobuhiko Yamamoto
,
Shigeru Kasai
,
Koji Eriguchi
,
Kouichi Ono
Plasma-induced photon irradiation damage on low-k dielectrics enhanced by Cu-line layout.
ICICDT
(2015)
Koji Eriguchi
,
Yoshinori Takao
,
Kouichi Ono
A new aspect of plasma-induced physical damage in three-dimensional scaled structures - Sidewall damage by stochastic straggling and sputtering.
ICICDT
(2014)
Masayuki Kamei
,
Yoshinori Takao
,
Koji Eriguchi
,
Kouichi Ono
Random telegraph noise as a new measure of plasma-induced charging damage in MOSFETs.
ICICDT
(2014)
Asahiko Matsuda
,
Yoshinori Nakakubo
,
Yoshinori Takao
,
Koji Eriguchi
,
Kouichi Ono
Atomistic simulations of plasma process-induced Si substrate damage - Effects of substrate bias-power frequency.
ICICDT
(2013)
Koji Eriguchi
,
Yoshinori Nakakubo
,
Asahiko Matsuda
,
Masayuki Kamei
,
Yoshinori Takao
,
Kouichi Ono
Optimization problems for plasma-induced damage - A concept for plasma-induced damage design.
ICICDT
(2012)
Koji Eriguchi
,
Yoshinao Harada
,
Masaaki Niwa
stack gate dielectrics.
Microelectron. Reliab.
41 (4) (2001)
Takayuki Yamada
,
Masaru Moriwaki
,
Yoshinao Harada
,
Shinji Fujii
,
Koji Eriguchi
Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics.
Microelectron. Reliab.
41 (5) (2001)