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deposited with metal-organic precursor TBTDET.
L. Pinzelli
M. Gros-Jean
Y. Bréchet
F. Volpi
A. Bajolet
J.-C. Giraudin
Published in:
Microelectron. Reliab. (2007)
Keyphrases
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chemical vapor deposition
silicon nitride
thin film
high density
electron microscopy
electrical properties
light emitting diodes
high temperature
silicon dioxide
grain size
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