Low temperature formation of ?-FeSi2 polycrystalline microstructure by pulsed laser deposition and thermal annealing.
Hiroharu SugawaraShingo NakamuraMasayuki OouchiYui KumuraTakenobu ShishidoTakatoshi IgarashiMasato KishiMasahiro TsuchiyaPublished in: IEICE Electron. Express (2004)
Keyphrases
- thin film
- thermal conductivity
- room temperature
- injection lasers
- electrical properties
- high density
- infrared
- chemical vapor deposition
- simulated annealing
- mathematical model
- solder ball connect
- plasma etching
- visible spectrum
- thermal images
- data mining
- mechanical properties
- laser radar
- gate dielectrics
- multi layer
- air temperature
- fiber optic
- film thickness
- composite materials
- thermal infrared
- laser beam
- power plant
- multispectral
- clustering algorithm