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Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering.
Luís da Silva Zambom
Ronaldo Domingues Mansano
Ana Paula Mousinho
Published in:
Microelectron. J. (2009)
Keyphrases
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silicon nitride
thin film
electrical properties
film thickness
plasma etching
high density
chemical vapor deposition
magnetic field
gate dielectrics
agent architecture
leakage current
multi layer
electron microscopy
neural network
room temperature
reactive planning
real time
multi agent systems
genetic algorithm