A Recombination-Enhanced-Defect-Reaction-Based Model for the Gate Switching Instability in SiC MOSFETs.
Tibor GrasserMaximilian W. FeilKatja WaschneckHans ReisingerJudith BerensDominic WaldhörA. VasilevMichael WaltlThomas AichingerM. BockstedteWolfgang GustinGregor PobegenPublished in: IRPS (2024)
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