Machine learning-based modeling and operation of plasma-enhanced atomic layer deposition of hafnium oxide thin films.
Yangyao DingYichi ZhangHo Yeon ChungPanagiotis D. ChristofidesPublished in: Comput. Chem. Eng. (2021)
Keyphrases
- thin film
- electron microscopy
- multi layer
- machine learning
- chemical vapor deposition
- room temperature
- plasma etching
- silicon nitride
- high density
- short circuit
- grain size
- machine learning methods
- data driven approaches
- machine learning algorithms
- neural network
- solar cell
- middle layer
- learning algorithm
- learning tasks
- silicon dioxide
- kernel methods