Hysteresis effect in bottom-gate polymorphous silicon thin-film transistors.
N. A. HastasN. ArpatzanisC. A. DimitriadisJulien BrochetFrançois TemplierG. KamarinosPublished in: Microelectron. Reliab. (2011)
Keyphrases
- thin film
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- plasma etching
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- chemical vapor deposition
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- silicon dioxide
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