thin films prepared by RF magnetron sputtering.

Xiu-Tian Zhao Kenji Sakka Naoto Kihara Yasuyuki Takada Makoto Arita Masataka Masuda

Published in: Microelectron. J. (2005)

Keyphrases

thin film
film thickness
radio frequency
magnetic field
short circuit
high density
relevance feedback
multi layer
grain size
chemical vapor deposition
solar cell
room temperature
silicon nitride
electrical properties
database
range images
low cost
plasma etching
rf sputtering
three dimensional