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Electrochemical Phenomena in Thin Films of Silicon Dioxide on Silicon.
Donald P. Seraphim
Andrew E. Brennemann
Francois Max d'Heurle
Harold L. Friedman
Published in:
IBM J. Res. Dev. (1964)
Keyphrases
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silicon nitride
silicon dioxide
thin film
high temperature
space charge
electrical properties
mass transfer
high density
machine learning
cost effective
grain size
film thickness
short circuit
leakage current
plasma etching