Fabrication and characterisation of high quality ZnO thin films by reactive electron beam evaporation technique.
R. Al AsmarG. FerblantierJ. L. SauvajolAlain GianiA. KhouryA. FoucaranPublished in: Microelectron. J. (2005)
Keyphrases
- thin film
- electron beam
- high quality
- integrated circuit
- high density
- x ray
- semiconductor devices
- grain size
- multi layer
- design parameters
- solar cell
- high resolution
- plasma etching
- short circuit
- white light interferometry
- electron beam lithography
- chemical vapor deposition
- film thickness
- room temperature
- database systems
- single image