Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3-O2 Reactive Ion Etching: The Effect of NO Surface Reaction.
Nguyen Hoang TungHeesoo LeeDuy Khoe DinhDae-Woong KimJin Young LeeGeon Woong EomHyeong-U. KimWoo Seok KangPublished in: Sensors (2024)