Login / Signup

Key measurements of ultrathin gate dielectric reliability and in-line monitoring.

W. W. (Bill) AbadeerAsmik BagramianDavid W. ConkleCharles W. GriffinEric LangloisBrian F. LloydRaymond P. MalletteJames E. MassuccoJonathan M. McKennaSteven W. MittlPhilip H. Noel
Published in: IBM J. Res. Dev. (1999)
Keyphrases
  • gate dielectrics
  • electrical properties
  • field effect transistors
  • real time
  • monitoring system
  • database
  • data sets
  • line segments
  • leakage current
  • decision support
  • measurement noise