Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks.
M. GentiliA. LucchesiniL. ScopaPaolo LugliA. PaolettiG. MessinaS. SantangeloA. TucciaronePublished in: Eur. Trans. Telecommun. (1990)
Keyphrases
- electron beam
- x ray
- high resolution
- electron beam lithography
- digital x ray images
- intraoperative
- medical imaging
- transmission electron microscopy
- semiconductor devices
- x ray images
- integrated circuit
- design parameters
- low resolution
- image processing
- electron microscope
- electron microscopy
- projection images
- three dimensional
- ct scans
- micro ct
- remote sensing
- super resolution
- magnetic resonance images
- tomographic images
- edge detection
- computer tomography
- cone beam
- real time