On the PBTI Reliability of Low EOT Negative Capacitance 1.8 nm HfO2-ZrO2 Superlattice Gate Stack on Lg=90 nm nFETs.
Nirmaan ShankerLi-Chen WangSuraj CheemaWenshen LiNilotpal ChoudhuryChenming HuSouvik MahapatraSayeef S. SalahuddinPublished in: VLSI Technology and Circuits (2022)