Percolative, Multifractal, and Symmetry Properties of the Surface at Nanoscale of Cu-Ni Bimetallic Thin Films Deposited by RF-PECVD.
Robert S. MatosNilson S. FerreiraStefan TaluAtefeh GhaderiShahram SolaymaniMarcelo A. PiresEdgar Aparecido SanchesHenrique D. da Fonseca FilhoPublished in: Symmetry (2022)
Keyphrases
- thin film
- chemical vapor deposition
- electron microscopy
- film thickness
- mechanical properties
- white light interferometry
- high density
- three dimensional
- grain size
- short circuit
- fractal dimension
- silicon nitride
- solar cell
- bilateral symmetry
- electrical properties
- plasma etching
- room temperature
- multi layer
- surface reconstruction
- range data
- d objects