Mitigating thermo mechanical stress in high-density 3D-LSI through dielectric liners in Cu- through silicon Via _ µ-RS and µ-XRD study.
Mariappan MurugesanJichoel BeaHiroyuki HashimotoK. W. LeeMitsu KoyanagiTakafumi FukushimaTetsu TanakaPublished in: 3DIC (2015)