Anisotropic silicon etch to house CMOS compatible MEMS microstructures without planarization techniques.
Carlos Ramón Báez ÁlvarezWilfrido Calleja ArriagaMónico Linares ArandaAlfonso Torres-JácomePublished in: CCE (2017)
Keyphrases
- high speed
- low cost
- cmos technology
- gate dielectrics
- silicon on insulator
- metal oxide semiconductor
- low power
- analog to digital converter
- power consumption
- anisotropic diffusion
- analog vlsi
- low voltage
- electrical properties
- diffusion filtering
- high density
- circuit design
- high resolution
- plasma etching
- transmission electron microscopy
- tensor field
- power supply
- image sensor
- diffusion equation
- hardware and software