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Fabrication and simulation of electrically reconfigurable dual metal-gate planar field-effect transistors for dopant-free CMOS.
Tillmann Krauss
Frank Wessely
Udo Schwalke
Published in:
DTIS (2017)
Keyphrases
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field effect transistors
high density
chip design
semiconductor devices
mathematical analysis
gate dielectrics
steady state
schottky barrier
low cost
data center
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thin film
power consumption
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power supply
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real time