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Highly conformal and adhesive electroless barrier and Cu seed formation using nanoparticle catalyst for realizing a high aspect ratio cu-filled TSV.
S. Nishizawa
Ryohei Arima
Tomohiro Shimizu
Shoso Shingubara
Fumihiro Inoue
Published in:
3DIC (2013)
Keyphrases
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electron microscopy
aspect ratio
x ray
thin film
bounding box
computer vision
ground truth
shape from shading
perspective projection