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Investigation of Low-Damage Sputter-Deposition of ITO Films on Organic Emission Layer.
Hao Lei
Keisuke Ichikawa
Meihan Wang
Yoichi Hoshi
Takayuki Uchida
Yutaka Sawada
Published in:
IEICE Trans. Electron. (2008)
Keyphrases
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electrical properties
chemical vapor deposition
metal oxide
thin film
silicon dioxide
film thickness
grain size
permalloy films
multi layer
application layer
plasma etching
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