Transformation and Mechanical Properties of TiNi Thin Films Sputter Deposited at Various Argon Pressures for Micromachine Actuators.
Seiji ShimizuKatsutoshi KuribayashiPublished in: J. Robotics Mechatronics (1999)
Keyphrases
- thin film
- mechanical properties
- chemical vapor deposition
- silicon nitride
- film thickness
- composite materials
- grain size
- high density
- finite element model
- short circuit
- rf sputtering
- stainless steel
- multi layer
- control system
- electrical properties
- room temperature
- experimental data
- three dimensional
- degrees of freedom
- magnetic field
- refractive index
- image reconstruction
- data management
- neural network
- computer aided design
- spatial distribution