A facile nanowire fabrication approach based on edge lithography.

Yaoping Liu Wei Wang Haixia Alice Zhang Wengang Wu Zhihong Li

Published in: NEMS (2012)

Keyphrases

electron beam
electron beam lithography
integrated circuit
edge detection
edge information
high density
x ray
weighted graph
semiconductor devices
high speed
edge map
computer vision
multiple scales
design parameters
edge pixels
bayesian networks
three dimensional