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Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors.

Martin LembergerA. BaunemannAnton J. Bauer
Published in: Microelectron. Reliab. (2007)
Keyphrases
  • chemical vapor deposition
  • single source
  • thin film
  • high density
  • grain size
  • data sets
  • multi source
  • neural network
  • data fusion
  • field effect transistors