The Effect of a Phase Change on the Temperature Evolution during the Deposition Stage in Fused Filament Fabrication.
Sidonie F. CostaFernando M. DuarteJosé A. CovasPublished in: Comput. (2021)
Keyphrases
- chemical vapor deposition
- final stage
- phase difference
- plasma etching
- evolution process
- electrical properties
- high density
- high speed
- thin film
- integrated circuit
- change impact analysis
- data sets
- thin film transistor
- initial stages
- neural network
- multiscale
- solar radiation
- film thickness
- high temperature
- level set
- data fusion
- printed circuit boards
- training phase