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Patterns of Exposing Integrity of 28nm-node High-k Gate Dielectric on p-substrate with Nitridation Treatments.

Si-Ping LiJia-Wei XuWei-Hao LiJian-Ming ChenChao-Nan WeiWen-How LanMu-Chun Wang
Published in: ICKII (2020)
Keyphrases
  • leakage current
  • pattern mining
  • data mining techniques
  • pattern discovery
  • gate insulator
  • wide range
  • cmos technology
  • silicon dioxide
  • directed graph
  • temporal patterns
  • electrical properties