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Investigations of vapor phase deposited transition metal dichalcogenide films for future electronic applications.
Toby Hallam
Hye-Young Kim
Maria O'Brien
Riley Gatensby
Niall McEvoy
Georg S. Duesberg
Published in:
ESSDERC (2015)
Keyphrases
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chemical vapor deposition
silicon nitride
thin film
grain size
electrical properties
metal oxide
high density
permalloy films
long term
neural network
silicon dioxide
transmission line
preprocessing phase
bulletin board
predicting future
training phase
multi layer
control system
case study
data mining
real time