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Simulation in Amorphous Silicon and Amorphous Silicon Carbide Pin Diodes.
Dora Gonçalves
Miguel Fernandes
Paula Louro
Alessandro Fantoni
Manuela Vieira
Published in:
DoCEIS (2014)
Keyphrases
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high density
thin film
plasma etching
semiconductor devices
low cost
high speed
chemical vapor deposition
room temperature
mathematical model
simulation model
transmission electron microscopy
data center
high resolution
website
field effect transistors
silicon dioxide
information systems