Interface engineering of Si1-xGex gate stacks for high performance dual channel CMOS.
ChoongHyun LeeRichard G. SouthwickShogo MochizukiPaul JamisonRuqiang BaoRajan PandeyAniruddha KonarTakashi AndoVijay NarayananBala HaranHemanth JagannathanPublished in: ASICON (2017)
Keyphrases
- dual channel
- gate dielectrics
- leakage current
- low voltage
- cmos technology
- artificial intelligence
- high speed
- software engineering
- si sio
- low cost
- user friendly
- user interface
- electrical properties
- computer science
- analog vlsi
- mechanical engineering
- information systems
- engineering students
- engineering problems
- direct manipulation
- circuit design
- metal oxide semiconductor
- low power
- scientific computing
- multiple input
- field effect transistors
- vlsi circuits
- high reliability
- nano scale
- computer aided design
- high efficiency
- engineering design