Pulsed laser deposition (PLD) of hafnium oxide thin films.

Przemyslaw Plóciennik Anna Zawadzka Janusz Strzelecki Zbigniew Lukasiak Andrzej Korcala

Published in: ICTON (2014)

Keyphrases

thin film
silicon nitride
electron microscopy
room temperature
high density
grain size
plasma etching
short circuit
film thickness
chemical vapor deposition
electrical properties
fuel cell
viewpoint
multi layer
white light interferometry
artificial neural networks
neural network
genetic algorithm
database