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Pulsed laser deposition (PLD) of hafnium oxide thin films.
Przemyslaw Plóciennik
Anna Zawadzka
Janusz Strzelecki
Zbigniew Lukasiak
Andrzej Korcala
Published in:
ICTON (2014)
Keyphrases
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thin film
silicon nitride
electron microscopy
room temperature
high density
grain size
plasma etching
short circuit
film thickness
chemical vapor deposition
electrical properties
fuel cell
viewpoint
multi layer
white light interferometry
artificial neural networks
neural network
genetic algorithm
database