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plasma etching of silicon nitride thin films.

Baris FidanI. G. RosenTyler ParentAnupam Madhukar
Published in: ACC (2001)
Keyphrases
  • thin film
  • plasma etching
  • high density
  • short circuit
  • silicon nitride
  • grain size
  • solar cell
  • multi layer
  • image data
  • chemical vapor deposition
  • multi view
  • room temperature