Effect of rf power on structural, optical and morphological properties of ultrathin undoped ZnO films deposited by rf magnetron sputtering.
Jayaraman Vinoth KumarArturo MaldonadoYasuhiro MatsumotoMaría de la Luz Olvera-AmadorPublished in: CCE (2014)
Keyphrases
- rf sputtering
- magnetic field
- film thickness
- thin film
- electrical properties
- radio frequency
- room temperature
- relevance feedback
- refractive index
- chemical vapor deposition
- structural information
- image processing
- leakage current
- three dimensional
- silicon nitride
- power consumption
- grain size
- multiscale
- electron beam
- phase transition