Sub-20-nm DRAM Technology under Negative Bias Temperature Instability (NBTI): from Characterization to Physical Origin Identification.
Da WangYongkang XueYong LiuPengpeng RenZixuan SunZirui WangYueyang LiuZhijun ChengHaiyang YangXiangli LiuBlacksmith WuKanyu CaoRunsheng WangZhigang JiRu HuangPublished in: IRPS (2024)