Thin film deposition and microelectronic and optoelectronic device fabrication and characterization in monocrystalline alpha and beta silicon carbide.
Robert F. DavisGalina KelnerMichael S. ShurJohn W. PalmourJohn A. EdmondPublished in: Proc. IEEE (1991)
Keyphrases
- thin film
- plasma etching
- high density
- field effect transistors
- chemical vapor deposition
- semiconductor devices
- solar cell
- short circuit
- low density
- data center
- grain size
- white light interferometry
- silicon on insulator
- smart camera
- electron microscopy
- machine learning
- film thickness
- multi layer
- knowledge discovery
- high resolution