Back-end-of-line CMOS-compatible diode fabrication with pure boron deposition down to 50 °C.
Tihomir KnezevicTomislav SuligojXingyu LiuLis K. NanverAhmed ElsayedJan F. DickJörg SchulzePublished in: ESSDERC (2019)
Keyphrases
- back end
- high speed
- electrical properties
- plasma etching
- user friendly
- data management
- building blocks
- high density
- data types
- line segments
- thin film
- power consumption
- low cost
- chemical vapor deposition
- silicon on insulator
- integrated circuit
- computer simulation
- data sets
- thin film transistor
- circuit design
- light emitting
- analog vlsi
- detailed design
- liquid crystal displays
- focal plane
- transmission line
- data structure
- power supply
- image sensor
- low power
- real world