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On the Dependence of Band Alignment of SiO₂/Si Stack on SiO₂ Thickness: Extrinsic Or Intrinsic?
Yonggui Xu
Kai Han
Jinjuan Xiang
Xiaolei Wang
Published in:
IEEE Access (2020)
Keyphrases
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metal oxide
film thickness
silicon dioxide
electrical properties
leakage current
x ray
gate insulator
high speed
multi view
thin film
image alignment
solid state
multiscale
low cost
si sio