O-band silicon photonic Bragg-grating multiplexers using UV lithography.

Jonathan St-Yves Sophie LaRochelle Wei Shi

Published in: OFC (2016)

Keyphrases

electron beam
semiconductor devices
high speed
high density
low cost
physical characteristics
liquid crystal
real time
multiscale
frequency band
narrow band
plasma etching
silicon dioxide
electron beam lithography
dual band
level set
mobile robot
case study
image processing