Characterization and physical modeling of the temporal evolution of near-interfacial states resulting from NBTI/PBTI stress in nMOS/pMOS transistors.
Tibor GrasserBernhard StampferMichael WaltlGerhard RzepaKarl RuppFranz SchanovskyGregor PobegenKatja PuschkarskyHans ReisingerBarry J. O'SullivanBen KaczerPublished in: IRPS (2018)