Login / Signup

GHz C-V Characterization Methodology and Its Application for Understanding Polarization Behaviors in High-k Dielectric Films.

Yiming QuYang ShenMingji SuJiwu LuYi Zhao
Published in: IRPS (2022)
Keyphrases
  • gate insulator
  • dielectric constant
  • electrical properties
  • silicon dioxide
  • wide range
  • chemical vapor deposition
  • neural network
  • data mining
  • low cost
  • gate dielectrics