Electromigration limits of copper nano-interconnects.

Houman Zahedmanesh Olalla Varela Pedreira Zsolt Tokei Kristof Croes

Published in: IRPS (2021)

Keyphrases

thin film
electron microscopy
input output
nano scale
lower cost
fiber optic
artificial intelligence
multichip module
real time
databases
case study
database systems
digital images
medical images