Effect of sputtering condition on the surface properties of silicon oxide thin films prepared for liquid crystal alignment layers.
Shi-Joon SungEun-Ae JungDae-Hwan KimJin-Kyu KangKee-Jeong YangYun Seon DoByeong-Dae ChoiPublished in: Displays (2010)
Keyphrases
- liquid crystal
- thin film
- silicon nitride
- surface properties
- room temperature
- multi layer
- silicon dioxide
- plasma etching
- high density
- ccd camera
- film thickness
- electrical properties
- chemical vapor deposition
- magnetic field
- d objects
- dynamic range
- structured light
- perspective projection
- personal computer
- frame rate
- high speed
- low cost
- image processing