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Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits.

Donna R. CoteSon Van NguyenAnthony K. StamperDouglas S. ArmbrustDirk TobbenRichard A. ContiGill Yong Lee
Published in: IBM J. Res. Dev. (1999)
Keyphrases
  • chemical vapor deposition
  • thin film
  • plasma etching
  • high density
  • field effect transistors
  • short circuit
  • multi layer
  • high speed
  • grain size
  • delay insensitive
  • databases
  • circuit design
  • low cost
  • steady state
  • data center