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Influence of post-annealing on the mechanical and electrical properties of boron-doped nanocrystalline silicon thin films.
J. N. Ding
H. S. Qi
N. Y. Yuan
Y. L. He
G. G. Cheng
Published in:
NEMS (2009)
Keyphrases
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silicon nitride
electrical properties
thin film
film thickness
room temperature
silicon dioxide
plasma etching
simulated annealing
high density
chemical vapor deposition
solar cell
short circuit
multi layer
white light interferometry
database
grain size
low density
wireless sensor networks