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: H films deposited by PECVD for reliability of electronic, microsystems and optical applications.
Etienne Herth
Bernard Legrand
Lionel Buchaillot
Nathalie Rolland
Tuami Lasri
Published in:
Microelectron. Reliab. (2010)
Keyphrases
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chemical vapor deposition
thin film
high density
electrical properties
permalloy films
legal information
film thickness
low power
reliability analysis
design automation
real time
neural network
refractive index
three dimensional
silicon nitride